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Microchip Fabrication: A Practical Guide to Semiconductor Processing microchip fabrication peter van zant pdf
Van Zant distinguishes between epitaxy (growing a crystalline layer matching the substrate), CVD (Chemical Vapor Deposition) for dielectrics like silicon dioxide, and PVD (Physical Vapor Deposition) for metals like copper or aluminum. He emphasizes that deposition must be conformal—covering vertical sidewalls as evenly as horizontal surfaces—to prevent voids. The Art of Microchip Fabrication: A Comprehensive Guide
Example: FinFET geometry: fins with height ~40–60 nm and fin pitch scaled to control effective channel width; multiple fins used to achieve required drive current. microchip fabrication peter van zant pdf